溅射气体流量比对磷掺杂ZnO光学性质的影响

doi:10.16039/j.cnki.cn22-1249.2019.01.017

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摘要

采用磁控溅射方法在石英衬底上制备ZnO薄膜，利用XRD对薄膜结构进行表征，发光光谱和透射吸收光谱表征薄膜的光学性质，讨论了溅射气体流量比对薄膜光学性质的影响。结果表明，当Ar/O₂为1/0.05时，观察到明显的紫外发光，带隙宽度为3.310 eV。

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	解玉鹏
	王显德

关键词: 磁控溅射 ZnO薄膜 p型光学性质

Abstract:

ZnO films were prepared on quartz substrates by magnetron sputtering, the film structure was characterized by XRD, and the optical properties of the films were characterized by photoluminescence and transmission spectra, and the effect of the sputtering gas flow ratio on the optical properties of the films was discussed.The results show that when the Ar/O₂ is 1/0.05, the visible ultraviolet light is observed and the band gap width is 3.310 eV.

Key words: magnetron sputtering ZnO film p type optical properties

出版日期: 2019-01-25 发布日期: 2019-01-25 整期出版日期: 2019-01-25

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引用本文:

解玉鹏, 王显德. 溅射气体流量比对磷掺杂ZnO光学性质的影响 [J]. 吉林化工学院学报, 2019, 36(1): 79-82.
XIE Yu-peng, WANG Xian-de. Effect of Sputtering Gas Flow Ratio on the Optical Properties of Phosphor Doped ZnO . Journal of Jilin Institute of Chemical Technology, 2019, 36(1): 79-82.

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https://xuebao.jlict.edu.cn/CN/10.16039/j.cnki.cn22-1249.2019.01.017 或 https://xuebao.jlict.edu.cn/CN/Y2019/V36/I1/79

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